Ultrasonic Metal Processing Equipment

Ultrasonic Indium Coating Equipment

Ultrasonic Indium Coating Equipment uses ultrasonic cavitation and friction energy to coat uniform indium layer on substrates. It is widely used for target backplane, heat sink, ceramic, optoelectronic and semiconductor packaging. Features thin, even coating, low void rate and stable bonding interface.

Request Quote

Application Images

ultrasonic_indium_coater_for_different_applications

Product Overview

Product Introduction

The ultrasonic indium coater uses high-frequency ultrasonic vibration energy to spread molten indium evenly on substrate surfaces and form a tightly bonded indium interface layer. It is a flux-free indium coating solution for thermal interface preparation and dissimilar-material bonding in semiconductor and optoelectronic applications.

Compared with manual scraping and plating processes, it supports uniform, dense indium layers with low void rate. The process runs near room temperature to minimize thermal deformation of precision workpieces. It supports both fixed-area coating and scanning coating for sputtering targets, heat sinks, laser components, and other high-reliability thermal interfaces.

Key Features

Uniform and dense indium layer with controllable coating thickness

Low void rate & excellent interfacial thermal conductivity

Flux-free & clean and contamination-free process

Compatible with various substrates

copper / ceramic / molybdenum / glass / target backplane

Room-temperature process & minimal thermal deformation of substrates

Supports precise localized indium coating for small areas

Stable ultrasonic energy output for consistent coating quality

Modular structure & quick fixture change and easy commissioning

Technical Parameters

Applicable SubstratesCopper, molybdenum, ceramic, glass, target backplane
Single Coating Width5–60mm(Customized according to workwear requirements)
Indium Coating Thickness5–80μm(Customizable)
Ultrasonic Frequency20kHz ±0.5kHz or customized
Amplitude Range20–40μm

Applications

  • Semiconductor packaging
  • Sputtering target backplate bonding
  • Heat sink & thermal interface preparation
  • Optoelectronic devices
  • Laser components
  • Ceramic-to-metal dissimilar material joining
  • Infrared detectors
  • High-power modules

Frequently Asked Questions

Can you do sample testing before order?

Yes. We support sample testing. Please send your workpiece drawing and material information for evaluation.

Can you customize the horn and fixture?

Yes. Titanium horn, fixture, scanning stroke and coating width can be customized based on your product drawing.

What is the void rate of the indium interface?

Low void rate, suitable for high heat dissipation requirements of laser, semiconductor and target bonding.

Will high temperature damage my workpiece during coating?

It is room-temperature processing. The heat generated is low, thermal deformation of the substrate is minimal.

What is the thickness range of the indium layer?

Standard thickness 5–80 μm. Custom thickness is available according to your thermal design requirement.

What substrates can be coated with indium?

It works for copper, molybdenum, aluminum nitride ceramic, alumina ceramic, glass and sputtering target backplates.

Does indium coating need flux?

No, our ultrasonic indium coating process is flux-free. It avoids contamination and residue on the interface.

Need an Ultrasonic Indium Coater?

Send us your workpiece size, required parameters and application. Our engineering team will provide a suitable solution and competitive quotation for you promptly.

Request A Quote